Laser apparatus
US11569630B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 20, 2019 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Nov 20, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser apparatus that can generate a high-quality laser beam is provided. The laser apparatus is provided with a laser medium and an insulation layer. The laser medium has a first surface and a second surface. Incident laser light is incident on the first surface. The second surface totally reflects the incident laser light that is incident to the second surface at an incident angle equal to or larger than a critical angle. The insulation layer covers a second area of the second surface that surrounds a first area of the second surface, the first area totally reflecting the incident laser light. The laser medium is exposed in the first area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.