Method and apparatus for fabricating high performance optoelectronic devices
US11571675B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 2018 |
| Grant date | Feb 7, 2023 |
| Priority date | — |
| Expiry date | Dec 13, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J1/429
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods, apparatuses, and systems are provided for using laser ablation to manufacture nanoparticles. An example method includes steps of generating, by a laser beam generator, a laser beam, splitting, by a set of beam splitters, the laser beam into a plurality of derivative laser beams, and directing each derivative laser beam towards a plurality of targets. In this example method, the plurality of targets are submerged in corresponding synthesis solvents within corresponding synthesis chambers. Moreover, interaction of each derivative laser beam with its corresponding target releases nanoparticles into the corresponding synthesis solvent to create a nanoparticle solution including both the corresponding synthesis solvent and the released nanoparticles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.