Stereolithography apparatus and light emission control method
US11571851B2 · kind B2 · utility
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Key dates
| Filing date | Aug 8, 2018 |
| Grant date | Feb 7, 2023 |
| Priority date | — |
| Expiry date | Sep 21, 2038 |
Classification
- Technology area (CPC —)General
Abstract
A stereolithography apparatus according to an embodiment of the present technology includes a light source unit, a photo-detector, and a control unit. The light source unit includes a plurality of light-emitting elements that emits light for curing a photo-curing resin. The photo-detector detects the light emitted from the light source unit. The control unit generates an amount-of-light profile indicating an amount-of-light distribution of the light on the basis of the light detected by the photo-detector and controls light emission of the plurality of light-emitting elements on the basis of the amount-of-light profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.