Microchip charge patterning
US11574876B2 · kind B2 · utility
0Cited by
3References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2018 |
| Grant date | Feb 7, 2023 |
| Priority date | — |
| Expiry date | Jul 11, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/10329
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming a charge pattern on a microchip includes depositing a material on the surface of the microchip, and immersing the microchip in a fluid to develop charge in or on the material through interaction with the surrounding fluid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.