Reflective optical system
US11576251B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Jun 24, 2019 |
| Grant date | Feb 7, 2023 |
| Priority date | — |
| Expiry date | Jun 24, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0071
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective optical system (100) comprising at least one reflective aspheric surface (1) of focal length f0 and optical axis (Z), the surface being configured so that an incident laser beam (2) propagating along an axis (Z′) is focused along the optical axis (Z) with a FWHM ((Full Width at Half Maximum) of the intensity of the reflected beam along the optical axis (Z) being larger, preferably by a factor of at least 10, than the FWHM of the intensity of a focused beam reflected by a parabola having same focal length f0 and same optical axis (Z), receiving same beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.