Gas irradiation apparatus and method
US11576994B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Jun 15, 2022 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Jun 15, 2042 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA62B18/006
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A gas irradiation system has an irradiation chamber having a plurality of irradiation compartments disposed circumferentially about a central axis. One of the compartments is an inlet compartment. The inlet compartment has an aperture at the bottom through which gas flows from the compartment. A UV LED is disposed within or adjacent to the aperture, where the UVC LED is configured to irradiate the gas and neutralize pathogens. Circumferentially adjacent to one side of the inlet irradiation compartment is an outlet irradiation compartment. Circumferentially adjacent in the opposite circumferential direction on the other side of the inlet radiation compartment is the first of a plurality of intermediate irradiation compartments. These intermediate compartments extend circumferentially about the central axis between the inlet compartment and the outlet compartment. The gas flows sequentially through each of the irradiation compartments, being irradiated in each compartment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.