Method of forming a graphene device using polymer material as a support for a graphene film
US11577960B2 · kind B2 · utility
0Cited by
3References
4Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Mar 9, 2016 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Mar 9, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B2204/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention concerns a method of forming a graphene device, the method comprising: forming a graphene film (100) over a substrate; depositing, by gas phase deposition, a polymer material covering a surface of the graphene film (100); and removing the substrate from the graphene film (100), wherein the polymer material forms a support (102) for the graphene film (100).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.