Cerium based particles
US11578235B2 · kind B2 · utility
0Cited by
2References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2018 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Dec 16, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/16
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to cerium-based particles and their use as a component of a composition for polishing. The present invention also relates to the method of preparation of the cerium-based particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.