Focus assessment in dynamically focused laser system
US11579440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2020 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Jan 4, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Some embodiments may include a method assessing whether a dynamic focus module in a three axis galvanometric scanning system (three-axis GSS) is associated with a focus calibration error. The method may include identifying a reference layer associated with a surface of the work piece and positive and negative offset distances each a difference distance above or below the reference layer, respectively, and selecting a target pattern based on the offset distances, wherein the pattern includes an individual line for each offset distance. The method may include commanding the three-axis GSS to draw the target pattern on the work piece, and then assessing whether the dynamic focus module is associated with the focus calibration error by correlating laser marking artifacts on the work piece to ones of the individual lines of the selected pattern. Other embodiments may be disclosed and/or claimed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.