Method and system of additive manufacturing contour-based hatching
US11584083B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2019 |
| Grant date | Feb 21, 2023 |
| Priority date | — |
| Expiry date | May 8, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A system and method including receiving a data model representation of a part, the data model representation including at least one layer of the part and inner and outer contours for the at least one layer; determining a hatch pattern for each layer of the at least one layer of the part, the hatch pattern for each layer being dependent on the inner and outer contours for each respective layer; generating a record of the determined hatch pattern for each layer, the record including locations for the hatch pattern for each layer; and saving the record of the determined hatch pattern for each layer of the part. In some aspects, the record of the determined hatch pattern for each layer of the part may be used in an additive manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.