Production of arylpyrrol compounds in the presence of DIPEA base
US11584716B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2018 |
| Grant date | Feb 21, 2023 |
| Priority date | — |
| Expiry date | Aug 20, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D207/337
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A process A for the production of compounds of formula I is provided.Process A includes Step A of reacting compounds of formula II with 2,3-dihalopropionitrile or 2-haloacrylonitrile in the presence of DIPEA. A process B for the production of compounds of formula III is also provided. Process B includes Step B of reacting compounds of formula I with Br2 in the presence of DIPEA. A process C for the production of compounds of formula IV is further provided.Process C includes Step C of reacting compounds of formula III with di(C1-C4-alkoxy)methane and either POCl3, or a mixture comprising POCl3 and DMF, in the presence of DIPEA. Additionally, the use of DIPEA as a base in the production of compounds of formula I, compounds of formula III, or compounds of formula IV is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.