Method of manufacturing mask, mask manufactured by the same, and method of manufacturing display apparatus by using the same
US11584983B2 · kind B2 · utility
1Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 18, 2020 |
| Grant date | Feb 21, 2023 |
| Priority date | — |
| Expiry date | Sep 18, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.