Dense plasma focus devices having first and second DPF accelerators
US11589451B2 · kind B2 · utility
3Cited by
7References
20Claims
0Family size
Inventor
Key dates
| Filing date | Feb 21, 2020 |
| Grant date | Feb 21, 2023 |
| Priority date | — |
| Expiry date | Feb 21, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system for performing enhanced dense plasma acceleration includes two dense plasma fusion accelerators, each having two electrodes. One of the electrodes is positioned within a volume of the other. A conductive ring couples electrodes of the two plasma fusion accelerators. A plasma sheath from one accelerator and a plasma sheath from the other accelerator interact to form a portion of a cusp pinch. The plasma sheaths form portions of the cusp pinch via apertures of electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.