Vat resin with additives for thiourethane polymer stereolithography printing
US11591485B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 19, 2022 |
| Grant date | Feb 28, 2023 |
| Priority date | — |
| Expiry date | Apr 19, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2075/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.