Manufacturing method of display device
US11594561B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2020 |
| Grant date | Feb 28, 2023 |
| Priority date | — |
| Expiry date | Mar 23, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/0212
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.