Target debris collection device and extreme ultraviolet light source apparatus including the same
US11599031B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2021 |
| Grant date | Mar 7, 2023 |
| Priority date | — |
| Expiry date | Dec 20, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.