Patent · US Active

Method for manufacturing a substrate having a region mechanically decoupled from a support, method for manufacturing at least one spring, and a substrate

US11608264B2 · kind B2 · utility

0Cited by
3References
11Claims
0Family size

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Key dates

Filing dateDec 15, 2017
Grant dateMar 21, 2023
Priority date
Expiry dateMay 4, 2040

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/0133
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method for manufacturing a substrate including a region, which is mechanically decoupled from a support and has at least one component situated on the region; at least one recess being introduced on a front side of the substrate; an etching pattern being prepared on a back side of the substrate and etched anisotropically in such a manner, that vertical channels are produced on the back side of the substrate; and subsequently, a cavity being introduced at the back side of the substrate; the at least one recess on the front side of the substrate being connected to the cavity on the back side of the substrate; and in at least one region between the front side of the substrate and the cavity, at least two recesses or at least two segments of a recess being interconnected by at least one channel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.