Patent · US Active

Fabricating non-uniform diffraction gratings

US11609365B2 · kind B2 · utility

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6References
20Claims
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Key dates

Filing dateAug 8, 2019
Grant dateMar 21, 2023
Priority date—
Expiry dateJul 23, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31711
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of fabricating non-uniform gratings includes implanting different densities of ions into corresponding areas of a substrate, patterning, e.g., by lithography, a resist layer on the substrate, etching the substrate with the patterned resist layer, and then removing the resist layer from the substrate, leaving the substrate with at least one grating having non-uniform characteristics associated with the different densities of ions implanted in the areas. The method can further include using the substrate having the grating as a mold to fabricate a corresponding grating having corresponding non-uniform characteristics, e.g., by nanoimprint lithography.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.