Systems and methods for optimal source material deposition along hole edges
US11613805B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2020 |
| Grant date | Mar 28, 2023 |
| Priority date | — |
| Expiry date | Feb 10, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.