Patent · US Active

Planarization of photovoltaics

US11616154B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 27, 2019
Grant dateMar 28, 2023
Priority date
Expiry dateJul 8, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50

Abstract

Various processes can apply pressure and/or heat to a photovoltaic (PV) layer, including processes that integrate solar cells into different types of industrial glass such as an autoclave lamination process. The disclosure describes a planarization technique that can be used on the PV layer to eliminate point loads caused by such processes. In an aspect, a method for producing a component is described that includes disposing or placing a planarization material on a PV layer, modifying a physical form of the planarization material to provide a planar surface made of the planarization material on one side of the PV layer having surface irregularities, and forming a stack of layers (e.g., as part of an autoclave lamination process) for the component by disposing a first layer over the planar surface on the one side of the PV layer and a second layer over the other, opposite side of the PV layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.