Method for chemical vapor deposition of synthetic diamond using multiple hot filament units
US11618683B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2019 |
| Grant date | Apr 4, 2023 |
| Priority date | — |
| Expiry date | Jan 8, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for synthesizing a diamond by chemical vapor deposition, the method may include heating at least one internal space of at least one hot filament unit; wherein the at least one hot filament unit is positioned in a vacuum chamber; wherein a volume of each internal space out of the at least one internal space is smaller than one half of a volume of the vacuum chamber; feeding at least one gas to the at least one internal space; wherein the at least one gas comprises at least a carbon carrier gas; breaking the at least one gas by the at least one hot filament unit, to provide at least one radical; and depositing the at least one radical on an area of a substrate to provide the diamond.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.