Methods of producing optically-finished thin diamond substrates or windows of high aspect ratio
US11618945B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Oct 25, 2019 |
| Grant date | Apr 4, 2023 |
| Priority date | — |
| Expiry date | Oct 25, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method of forming a diamond film, substrate, or window, a substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the substrate. The grown diamond film, substrate, or window has a thickness between 150-999 microns and an aspect ratio≥100, wherein the aspect ratio is a ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The substrate can optionally be removed or separated from the grown diamond film, substrate, or window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.