Sorbent based gas concentration monitor
US11619601B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 19, 2020 |
| Grant date | Apr 4, 2023 |
| Priority date | — |
| Expiry date | Aug 26, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K2213/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas monitor apparatus includes a sorbent material that adsorbs a target gas based on a concentration of the target gas in a monitored environment and a reference material that does not respond to the target gas. The gas monitor also includes a first thermistor disposed within the sorbent material and a second thermistor disposed within the reference material, the first thermistor to provide a first indication of a first temperature of the sorbent material and the second thermistor to provide a second indication of a second temperature of the reference material. A processing device determines a concentration of the target gas based at least in part on a differential measurement between the first temperature and the second temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.