Patent · US Active

Method and device for superimposing at least two images of a photolithographic mask

US11620429B2 · kind B2 · utility

0Cited by

2References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Gilles Tabbone · Jena, DE
Carsten Schmidt · Jena, DE

Key dates

Filing date	Jun 26, 2020
Grant date	Apr 4, 2023
Priority date	—
Expiry date	Feb 24, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG06F2119/18
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

The present invention relates to a method for superimposing at least two images of a photolithographic mask, wherein the method comprises the following steps: (a) determining at least one first difference of at least one first image relative to design data of the photolithographic mask; (b) determining at least one second difference of at least one second image relative to design data of the photolithographic mask, or relative to the at least one first image; and (c) superimposing the at least one first image and the at least one second image taking account of the at least one first difference and the at least one second difference.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.