Photocurable composition excellent in curing depth
US11622916B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2021 |
| Grant date | Apr 11, 2023 |
| Priority date | — |
| Expiry date | Apr 18, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/17
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
[Problem]To provide a photocurable composition having a high curing depth.[Solution]To provide a photocurable composition of the present disclosure comprises (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator, and (D) photopolymerization accelerator, wherein, the photocurable composition comprises (D-1) amine compound represented by formula (1) as the (D) photopolymerization accelerator. (In the formula (1), R1 is a substituent represented by formula (2), and R2 and R3 are substituents represented by formula (2) or substituents selected from —OH group, —O— group, —S— group, —NH—C(O)—NH— group, —C(O)—O— group, —OC(O)— group, —OC(O)—NH— group, —NH—C(O)—O— group, halogen, an organic group which may have an alkoxysilyl group, an aromatic ring which may have a substituent and an alicyclic heterocycle which may have a substituent. Further, R2 and R3 may be H when at least one or more R4s of the formula (2) are an aromatic ring, and R3 may be H when R2 is a substituent represented by the formula (2)).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.