Mitigating defects in an electrochromic device under a bus bar
US11623433B2 · kind B2 · utility
3Cited by
23References
16Claims
0Family size
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Key dates
| Filing date | Jun 14, 2017 |
| Grant date | Apr 11, 2023 |
| Priority date | — |
| Expiry date | Aug 10, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1524
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.