Cleaning agent for semiconductor component, and use thereof
US11634670B2 · kind B2 · utility
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1References
16Claims
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Key dates
| Filing date | Oct 30, 2019 |
| Grant date | Apr 25, 2023 |
| Priority date | — |
| Expiry date | Oct 30, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A semiconductor cleaning agent containing a sulfonic acid group-containing polymer, wherein a content of at least one metal selected from the group consisting of Na, Al, K, Ca and Fe is 0.7 ppm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.