High-resolution shadow masks
US11638388B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2021 |
| Grant date | Apr 25, 2023 |
| Priority date | — |
| Expiry date | Apr 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A shadow mask for patterned vapor deposition of an organic light-emitting diode (OLED) material includes a ceramic membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. A multilayer peripheral support is attached to a rear surface with a hollow portion beneath the aperture array. A compressively-stressed interlayer balances the tensile stress of the ceramic membrane. A shadow mask module with multiple shadow masks is also provided and includes a rigid carrier having plural windows with a shadow mask positioned in each window. To make the module, shadow mask blanks are affixed to each carrier window followed by etching of apertures and support layers. In this way extremely flat masks with precise aperture patterns are formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.