Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same
US11639470B2 · kind B2 · utility
0Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2021 |
| Grant date | May 2, 2023 |
| Priority date | — |
| Expiry date | Jul 29, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/621
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.