Patent · US Active

High purity 2-naphthylacetonitrile and method for producing same

US11643386B2 · kind B2 · utility

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6Claims
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Key dates

Filing dateOct 28, 2020
Grant dateMay 9, 2023
Priority date
Expiry dateOct 28, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C255/33
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

High purity 2-naphthylacetonitrile with fewer impurities can be used as a starting material or intermediate for synthesizing various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds represented by the formulas (a)-(j) at a content of a predetermined area % or below. A method for producing high purity 2-naphthylacetonitrile, may include: subjecting 2′-acetonaphthone to a Willgerodt reaction in the presence of an additive where necessary, and hydrolyzing the obtained amide compound to give 2-naphthylacetic acid; and reacting the 2-naphthylacetic acid obtained in the subjecting, a halogenating agent and sulfamide in the presence of a catalyst as necessary in an organic solvent to give 2-naphthylacetonitrile.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.