Patent · US Active

Stealth dicing method including filamentation and apparatus thereof

US11646228B2 · kind B2 · utility

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8Claims
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Key dates

Filing dateJul 13, 2020
Grant dateMay 9, 2023
Priority date
Expiry dateAug 25, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB23K2103/56
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

The present disclosure provides a stealth dicing method and apparatus. With the method, the focusing element focuses the laser beam on the surface of material to be diced, and the dynamic-equilibrium plasma channel is formed in the material to be diced by means of self-focusing and defocusing effect of plasma generated by ionizing the material to be diced. The modified layer may be formed in the material to be diced throughout the plasma channel, so as to realize stealth dicing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.