Deposition mask group, manufacturing method of electronic device, and electronic device
US11649539B2 · kind B2 · utility
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1References
8Claims
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Assignee
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Key dates
| Filing date | Jul 12, 2021 |
| Grant date | May 16, 2023 |
| Priority date | — |
| Expiry date | Jul 12, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask group includes a first deposition mask having two or more first through holes arranged along two different directions, a second deposition mask having two or more second through holes arranged along two different directions and a third deposition mask having two or more third through holes. The first through hole and the second through hole or the third through hole partly overlap when the first deposition mask, the second deposition mask and the third deposition mask are overlapped.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.