Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US11650501B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Mar 3, 2020 |
| Grant date | May 16, 2023 |
| Priority date | — |
| Expiry date | Mar 30, 2041 |
Classification
- Technology area (CPC —)General
Abstract
Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A),
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.