Isolation structure having an air gap to reduce pixel crosstalk
US11652124B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2020 |
| Grant date | May 16, 2023 |
| Priority date | — |
| Expiry date | Jan 7, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
Abstract
An isolation structure can be formed between adjacent and/or non-adjacent pixel regions (e.g., between diagonal or cross-road pixel regions), of an image sensor, to reduce and/or prevent optical crosstalk. The isolation structure may include a deep trench isolation (DTI) structure or another type of trench that is partially filled with a material such that an air gap is formed therein. The DTI structure having the air gap formed therein may reduce optical crosstalk between pixel regions. The reduced optical crosstalk may increase spatial resolution of the image sensor, may increase overall sensitivity of the image sensor, may decrease color mixing between pixel regions of the image sensor, and/or may decrease image noise after color correction of images captured using the image sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.