Process for the generation of metal-containing films

US11655262B2 · kind B2 · utility

Inventors

• David Dominique Schweinfurth · Ludwigshafen, DE
• Lukas Mayr · Ludwigshafen, DE
• Sinja Verena Klenk · Ludwigshafen am Rhein, DE
• Sabine Weiguny · Freinsheim, DE
• Charles H. Winter · Bloomfield, US
• Kyle Blakeney · Fremont, US
• Nilanka Weerathunga Sirikkathuge · Detroit, US
• Tharindu Malawara Arachchige Nimanthaka Karunaratne · Detroit, US

Key dates

• Filing date: Mar 31, 2022
• Grant date: May 23, 2023
• Expiry date: Mar 31, 2042

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45553
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.