Low-reflection film-coated transparent substrate, photoelectric conversion device, coating liquid for forming low-reflection film of low-reflection film-coated transparent substrate, and method for producing low-reflection film-coated transparent substrate
US11661519B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2018 |
| Grant date | May 30, 2023 |
| Priority date | — |
| Expiry date | Jan 11, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2207/107
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A low-reflection film-coated transparent substrate of the present invention includes a transparent substrate and a low-reflection film formed on at least one principal surface of the transparent substrate. The low-reflection film is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound by the binder. The binder further contains an aluminum compound. The low-reflection film contains as components: 55 to 70 mass % of the fine silica particles; 25 to 40 mass % of the silica of the binder; 0.1 to 1.5 mass % of the aluminum compound in terms of Al2O3; and 0.25 to 3% of an organic component. The low-reflection film has a thickness of 80 to 800 nm. A transmittance gain is 2.5% or more, the transmittance gain being defined as an increase of average transmittance of the low-reflection film-coated transparent substrate in a wavelength range of 380 to 850 nm relative to average transmittance of the transparent substrate uncoated with the low-reflection film in the wavelength range. The organic component includes at least one sele…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.