Patent · US Active

Adhesives for chemical mechanical planarization applications

US11661532B2 · kind B2 · utility

0Cited by
10References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 7, 2016
Grant dateMay 30, 2023
Priority date
Expiry dateAug 9, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09J2483/00
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Adhesives for use in polishing pads in chemical mechanical planarization (CMP) applications are described. The adhesives include an adhesive component and exhibit particular properties. Also described are transfer tapes containing the adhesives, CMP pads utilizing the adhesives, and related methods of use.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.