Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device
US11662662B2 · kind B2 · utility
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20References
14Claims
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Key dates
| Filing date | Aug 17, 2020 |
| Grant date | May 30, 2023 |
| Priority date | — |
| Expiry date | Mar 15, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.