Occluder generation for structures in digital applications
US11663772B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2022 |
| Grant date | May 30, 2023 |
| Priority date | — |
| Expiry date | Jul 15, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T17/205
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is performed at a computing system for automatically generating an occluder, the method includes receiving an input model of the visual three-dimensional structure, the input model having a plurality of faces. The method includes generating an initial occluder by simplifying the input model into a plurality of candidate patches in a patch-based coarse mesh. The method includes comparing a first two-dimensional area occluded by the input model of the visual three-dimensional structure and a second two-dimensional area occluded by the initial occluder along the first view direction to determine a first quality metric based on a first number of pixels that are blocked by the input model that is also blocked by the initial occluder. The method includes removing a plurality of faces from the initial occluder while maintaining the first quality metric above a first threshold to form the occluder for the visual three-dimensional structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.