Imprint apparatus, and product manufacturing method
US11664225B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 10, 2019 |
| Grant date | May 30, 2023 |
| Priority date | — |
| Expiry date | May 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An imprint apparatus forms imprint material using a mold on a substrate. The imprint apparatus includes a movable stage configured to hold the substrate, a supply portion configured to discharge the imprint material, and a control unit configured to cause the supply portion to discharge the imprint material while moving the stage so that the imprint material is supplied onto the substrate. The control unit controls discharge of the imprint material from the supply portion so that a target amount of the imprint material is arranged at a target position on the substrate, based on property information indicating a relation between a discharge amount of imprint material from the supply portion and a position on a target object where the imprint material is to be arranged.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.