Patent · US Active

MEMS device having uniform contacts

US11667516B2 · kind B2 · utility

1Cited by

10References

20Claims

0Family size

Assignee

Qorvo US, Inc. · US

Inventors

Mickael Renault · San Jose, US
Jacques Marcel Muyango · Rocklin, US
Shibajyoti Ghosh Dastider · Roseville, US

Key dates

Filing date	Jun 19, 2020
Grant date	Jun 6, 2023
Priority date	—
Expiry date	Jul 17, 2040

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C1/00158
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method of forming a microelectromechanical device wherein a beam of the microelectromechanical device may deviate from a resting to an engaged or disengaged position through electrical biasing. The microelectromechanical device comprises a beam disposed above a first RF electrode and a second RF electrode. The microelectromechanical device further comprises one or more electrical contacts disposed below the beam. The one or more electrical contacts comprise a first layer of ruthenium disposed over an oxide layer, a titanium nitride layer disposed on the first layer of ruthenium, and a second layer of ruthenium disposed on the titanium nitride layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.