Patent · US Active

Manufacturing method of titanium dioxide solution and titanium dioxide film

US11667540B2 · kind B2 · utility

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Key dates

Filing dateNov 25, 2021
Grant dateJun 6, 2023
Priority date
Expiry dateNov 25, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2002/52
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The manufacturing method of titanium dioxide solution includes: mixing choline chloride, urea, boric acid, and titanium tetrachloride to form a first solution, wherein a molar concentration ratio of choline chloride to urea is 1:2, a molar concentration of titanium tetrachloride is 0.2 M to 0.4 M, and weight/volume of boric acid is 5 g/300 ml to 15 g/300 ml; and heating the first solute ion to form a second solution, wherein the second solution contains carbon/nitrogen doped titanium dioxide. In the manufacturing method of the present disclosure, the deep eutectic solution formed by choline chloride and urea may be used as a solvent, and may also be used as a carbon source and/or a nitrogen source. Therefore, titanium dioxide may be doped with carbon and/or nitrogen during the formation process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.