Substrate coating
US11668004B2 · kind B2 · utility
0Cited by
7References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2020 |
| Grant date | Jun 6, 2023 |
| Priority date | — |
| Expiry date | May 8, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45555
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A method for coating a vaporizing substrate includes depositing a film coating 12 on at least a part of a substrate 10 during the time when the substrate undergoes phase transition from essentially liquid phase to gaseous phase, where the substrate includes a chemical substance that participates in chemical deposition reaction(s) in gaseous phase, the gaseous species 101 formed upon vaporizing at least the portion of the substrate material, when undergoing chemical deposition reactions in gaseous phase, produce particulate 11 that forms at least one coating layer to produce the film coating 12.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.