Patent · US Active

Apparatus for measuring the pressure and flow rate of a high temperature corrosive liquid

US11668618B2 · kind B2 · utility

0Cited by
4References
19Claims
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Assignee

Inventors

Key dates

Filing dateSep 27, 2021
Grant dateJun 6, 2023
Priority date
Expiry dateJan 8, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01L7/18
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus for measuring a pressure of a corrosive or high temperature process liquid includes a pressure sensor in communication with the process liquid via a vertical tube. A buffer gas injected into the vertical tube forms a liquid/gas interface at a desired height. The buffer gas supply is then either isolated or regulated so as to cause the buffer gas pressure within the vertical tube to remain equal with the process liquid pressure. The pressure sensor indirectly measures the process liquid pressure by measuring the buffer gas pressure within the vertical tube, while remaining chemically and thermally protected from the process liquid. In embodiments, pressure measurements from a pair of gas buffered pressure sensors located upstream and downstream of a valve are combined with measurements of the process liquid temperature to determine a flow rate of the process liquid through the valve.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.