Dielectric and thin film floating metal stacking for embedded tunable filtering of high frequency signals
US11670828B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2021 |
| Grant date | Jun 6, 2023 |
| Priority date | — |
| Expiry date | Oct 7, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01P1/202
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
A filter apparatus is disclosed. The filter apparatus may include a plurality of dielectric layers. The plurality of dielectric layers may include one or more first dielectric layers formed of a first dielectric material and one or more second dielectric layers formed of a second dielectric material. The second dielectric material of the one or more second dielectric layers being different than the first dielectric material of the one or more first dielectric layers. The filter apparatus may further include one or more thin-film metal layers arranged between at least one dielectric layer of the plurality of dielectric layers and an additional dielectric layer of the plurality of dielectric layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.