Method and apparatus for generating a superficial structure
US11673364B2 · kind B2 · utility
1Cited by
0References
18Claims
0Family size
Inventor
Key dates
| Filing date | Oct 13, 2017 |
| Grant date | Jun 13, 2023 |
| Priority date | — |
| Expiry date | Nov 16, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB32B2553/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and related apparatus for producing an embossing on a substrate using a digital printing technology includes the application of an embossing liquid, for example a water-based liquid, on a non-polymerized resin layer and the subsequent polymerization of the resin with UV curing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.