Method for fabricating a crystalline metal-phosphide hetero-layer by converting first and second crystalline metal-source layers into first and second crystalline metal phosphide layers
US11674237B2 · kind B2 · utility
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Key dates
| Filing date | May 14, 2019 |
| Grant date | Jun 13, 2023 |
| Priority date | — |
| Expiry date | Apr 13, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/85
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Fabricating a crystalline metal-phosphide layer may include providing a crystalline base substrate and a step of forming a crystalline metal-source layer. The method may further include performing a chemical conversion reaction to convert the metal-source layer to the crystalline metal phosphide layer. One or more corresponding semiconductor structures can be also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.