Techniques for beam pattern adjustments in a LIDAR system
US11675085B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2022 |
| Grant date | Jun 13, 2023 |
| Priority date | — |
| Expiry date | Oct 31, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/42
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method include receiving a first beam pattern from an optical source that comprises a plurality of optical beams transmitted towards a target causing different spaces to form between each optical beam. The system and method include measuring a vertical angle between at least two of the optical beams along a first axis and calculating a second beam pattern based on the vertical angle and a pivot point that causes the optical beams to be transmitted towards the target with substantially uniform spacing. The system and method include adjusting, at the pivot point, one or more components to form the second beam pattern to adjust the plurality of different spaces to the substantially uniform spacing for transmission towards the target. The system and method include receiving return optical beams from the target to produce a plurality of points to form the point cloud.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.