Patent · US Active

Ferroelectric and multiferroic material structures

US11678587B2 · kind B2 · utility

0Cited by
0References
17Claims
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Assignee

Inventors

Key dates

Filing dateOct 21, 2020
Grant dateJun 13, 2023
Priority date
Expiry dateFeb 5, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11C11/221
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A ferroelectric device includes a substrate, a first electrode on the substrate, and a hexagonal ferroelectric material on the first electrode. The first electrode comprises a single crystal epitaxial material. By using a single crystal epitaxial material for an electrode to a hexagonal ferroelectric material, a high-quality material interface may be provided between these layers, thereby improving the performance of the ferroelectric device by allowing for a reduced coercive field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.