Ferroelectric and multiferroic material structures
US11678587B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2020 |
| Grant date | Jun 13, 2023 |
| Priority date | — |
| Expiry date | Feb 5, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/221
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A ferroelectric device includes a substrate, a first electrode on the substrate, and a hexagonal ferroelectric material on the first electrode. The first electrode comprises a single crystal epitaxial material. By using a single crystal epitaxial material for an electrode to a hexagonal ferroelectric material, a high-quality material interface may be provided between these layers, thereby improving the performance of the ferroelectric device by allowing for a reduced coercive field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.