Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US11679412B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Feb 24, 2022 |
| Grant date | Jun 20, 2023 |
| Priority date | — |
| Expiry date | Feb 24, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.